This instrument enables rapid densification with suppressed grain coarsening, preserving nanoscale microstructures.
It offers precise control over sintering kinetics and is ideal for fabricating complex or refractory advanced materials.

Electrospinning is a fibre production method that uses electric force to draw charged threads of polymer solutions or polymer melts up to fibre diameters in the order of some hundred nanometres.

Enables high-purity, fast thin-film deposition with precise control over thickness and properties. Effective for high melting point materials and is widely used in advanced technological applications.

RF/DC sputtering is a PVD technique where high-energy ions eject atoms from a target, which then deposit onto a substrate as a thin film. It is widely used in optical electronics, solar cells, sensors, magnetic devices, and biomedical applications.

Pulse Laser Deposition (PLD) is a physical vapor deposition method for thin film growth. A high-energy laser ablates a target, generating a plasma plume of atoms, ions, and clusters. These species condense onto a substrate, forming a uniform thin film.

A hydraulic pellet press compacts powdered materials into solid pellets using hydraulic pressure commonly employed in material science for sample preparation and analysis.

A spin coater rapidly spins flat substrates while dispensing liquid solutions, creating uniform thin films crucial for semiconductor manufacturing and thin film research.

Spray pyrolysis is a method for depositing thin films by spraying precursor solutions onto a heated substrate. As the solvent evaporates, it leaves behind a thin film of the desired material. This system is widely used in materials science to create uniform coatings for various applications, including semiconductors and thin-film solar cells.

The Uniaxial pressing method is a process of compacting powder into a rigid pellet by applying heat along with pressure in a uniaxial direction using a rigid punch.

In the process, Argon transports the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition.

In this process, Inert gases transport the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition.

In the process, Argon transports the vaporized solid precursor to a substrate for the deposition. The two-zone design allows for better control over temperature and pressure, leading to more precise and uniform deposition.